Basic Copper Sulphate Used as a Fungicide

Update:26-09-2018
Summary:

Basic copper sulphate is used as a sterilizing agent an […]

Basic copper sulphate is used as a sterilizing agent and insecticide. The active ingredient of the pesticide Bordeaux mixture is basic copper sulfate. The chemical formula of basic copper sulfate which can be prepared with copper sulfate and slaked lime is Cu4(OH)6SO4.

Basic copper sulphate is a copper-containing bactericide, which does not contain any harmful impurities, is not easy to cause phytotoxicity, is resistant to rain, and does not leave any residue on the surface of the plant. It has no resistance and can be mixed with common pesticides, such as 1605. Omethoate, monocrotophos, malathion, phoxim and pyrethroid pesticides. The application of basic copper sulphate in agriculture is very extensive. Common products are available in dosage form: 35% suspension; 30% suspension. 27.12% suspending agent, 50%, 80% wettable powder.

Basic copper sulphate is a multi-site bactericide. Because of its small particle size, good dispersibility and resistance to rain erosion, it can firmly adhere to the surface of plants to form a protective film. Basic copper sulphate relies on water on the surface of plants. Acidification, the gradual release of copper ions, inhibition of fungal spore germination and mycelial development, can effectively control the fungal and bacterial diseases of crops.

When the bactericide is sprayed evenly on the plant, the basic copper sulphate active ingredient relies on the acidification of water on the surface of the plant, gradually releasing copper ions, inhibiting fungal spore germination and hyphal development, and can be used for controlling pear scab, Apple leaf fruit disease.

The use of basic copper sulphate requires great attention. Due to its characteristics, this drug should not be mixed with ethyl phosphine-aluminum pesticides. In addition, it is recommended to use bactericides with different mechanisms of action in rotation to delay the generation of resistance.